Electronic Materials
Electron Beam stake スポーツベット
High Performance Positive EB Resist:stake スポーツベット20A series
Characteristics
stake スポーツベット20A is high performance positive EB resist which shows high resolution and good dry etch resistance.
EB stake スポーツベット product lineup
| Item | Viscosity(mPa•s) | FT(nm)@2000rpm | Solvent | Form | |
|---|---|---|---|---|---|
| EB stake スポーツベット | stake スポーツベット20A | 11 | 500 | Anisole | 1QT bottle/100ml bottle |
| stake スポーツベット20A-7 | 7 | 300 | |||
Developer product lineup
| Item | Feature | Package | |
|---|---|---|---|
| Developer | ZED-N50 | high sensitivity | GAL bottle |
stake スポーツベット20A
Spin Curve
High resolution
ZEP520A can resolve L/S=25nm/25nm(FT=50nm).Developer:ZED-N50Evaluation sample:stake スポーツベット 520 A-7 was diluted 2.1 times with anisole.
High Performance Positive EB Resist:stake スポーツベット30A
Characteristics
stake スポーツベット30A is a high performance positive e-beam resist with ultra fine resolution, superior dry etch resistance, and wide process margin ever before.Thin film formation is possible depending on coating condition.
Product
| Item | Viscosity(mPa•s) | FT(nm)@2000rpm | Solvent | Package | |
|---|---|---|---|---|---|
| E-Beam stake スポーツベット | stake スポーツベット30A-6 | 6 | 200 | Anisole | 1QT bottle/100ml bottle |
Developer product
| Item | Feature | Package | |
|---|---|---|---|
| Developer | ZED-N60 | High resolutionWide margin | Gallon bottle |
stake スポーツベット30A
Spin Curve
Ultra fine resolution
ZEP530A has achieved L/S=18 nm.It has wide exposure margin.Evaluation sample:stake スポーツベット 530 A-6 was diluted 3 times with anisole.
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